US Patent 10,031,288 issued to Etaphase: “Optical structures and hyperuniform disordered material “ Abstract follows: An optical structure and a system includes a Hyperuniform Disordered Solid (“HUDS”) structure and a waveguide. The HUDS structure is formed by walled cells organized in a lattice.
Etaphase’s US9,720,172 patent issued. “Hyperuniform disordered material with resonant structures” Abstract follows: An optical structure includes a Hyperuniform Disordered Solid (“HUDS”) structure, a waveguide, and a resonant cavity. The HUDS structure is formed by walled cells organized in a lattice. The waveguide is configured to guide an optical signal. The resonant cavity is formed along a boundary of the waveguide. The resonant cavity is configured to be resonant at a frequency band that is a subset of a bandwidth of the optical signal.
US Patent Office issues US9,519,104 to Etaphase Abstract follows: An optical structure includes a Hyperuniform Disordered Solid (“HUDS”) structure, a photonic crystal waveguide, and a perforated resonant structure. The HUDS structure is formed by walled cells organized in a lattice. The photonic crystal waveguide is configured to guide an optical signal and includes an unperforated central strip extended lengthwise and three rows of circular perforations disposed on each side of the unperforated central strip. The perforated resonant structure is formed along a boundary of the photonic crystal waveguide. The perforated resonant structure is configured to be resonant at a frequency band that is a subset of a bandwidth of the optical signal. The perforated resonant structure includes an outer segment, a middle segment, and an inner segment of the circular perforations that are offset away from the unperforated central strip at a first, second, and third offset distance.
May 2015 In their recent report, Impact of Photonic Materials in Key Applications, market research firm Frost and Sullivan has called out US application US20140366647 “Narrow-band frequency filters and splitters, photonics sensors, and cavities having pre-selected cavity modes” as a ‘key patent’ in the advance of metamaterials in photonics. Etaphase is the exclusive licensee of this intellectual property. The inventors are Etaphase co-founders and members of the core scientific team. The use of Etaphase’ hyperuniform disordered structures (‘HUDS’) in these photonic components has commercial applications in data communications, optical processing, big data, security and defense.
2014 October. Etaphase successfully completes Phase I SBIR. Etaphase is pleased to announce successful completion of its NSF-funded research program into the application of HUDS in photonic integrated circuits.
2014 January. Etaphase awarded Phase I SBIR. Etaphase is pleased to announce that the National Science Foundation has selected Etaphase as a recipient of a Phase I SBIR grant for its research in the application of hyper-uniform disordered structures (‘HUDS™‘) material structural design to photonic integrated circuits (‘PICs’), entitled ‘Enabling Ultra-Compact Photonic Integrated Circuits with Designer Disordered Dielectrics’.
2013 September. Etaphase successfully completes proof of concept development cycle for photonic integrated circuit components based on HUDS technology. In conjunction with teams at the Universities of Washington and British Columbia, and San Francisco State University, Etaphase engineers designed, built, and tested the first set of photonic components using the company’s proprietary architecture and design tools. This outcome extends earlier work by the company’s founding scientific team at Princeton, where HUDS™ was implemented for microwave devices to deliver isotropic band-gaps.
2013 June. Etaphase applies for Phase I Small Business Innovative Research (‘SBIR’) grant from the National Science Foundation (‘NSF’). Fundamental Quasicrystals and HUDS™ research has been funded, in part, by NSF.
2012 October. Etaphase has successfully demonstrated structural color in commodity inorganic, non-toxic materials. This advance confirms HUDS as a viable alternative to colorants that are subject to UV degradation and fading, that are toxic, that require the use of toxic solvents, or that are not commercially practical as uniform colorants due to iridescence. HUDS structural color solutions can be used in inks, dyes, paints, in textiles, and in coatings for strong, bright, colors.
2012 October. Etaphase is pleased to announce it’s completion of demonstration of implementation of nano-scale HUDS architecture in silicon-on-insulator CMOS. This work confirms that optimized hyperuniform disordered structures can be implemented in silicon for photonic communications components using conventional industry-standard lithography techniques.